Optimized Condition of Extreme Ultra-Violet (EUV) light Emission from Laser-produced Tin Plasmas
氏名:A. Sunahara¹, T. Johzaki², S. Namba² , T. Morita³, N. Yamamoto³ , T. Morita⁴, M. Kume⁴, T. Soramoto⁴, T. Niinuma⁴,
T. Sugiura⁴, Y. Pan⁵, K. Tomita⁵ , K. Nishihara⁶
T. Sugiura⁴, Y. Pan⁵, K. Tomita⁵ , K. Nishihara⁶
所属:Purdue University¹,Hiroshima University²,Kyushu University³,Utsunomiya University⁴,Hokkaido University⁵,
ILE, Osaka University⁶
概要:輻射流体シミュレーションによるレーザー生成スズプラズマからの極端紫外(EUV)光の発光条件の最適化。2次元輻射流体コードStar2Dを用いCO2レーザー生成スズプラズマから放射される極端紫外 (13.5nm, EUV)光の条件最適化を図り、レーザーからEUV光への変換効率が10%以上なる条件を見出した.
論文掲載,発表実績:
(学術雑誌掲載論文)
- Atsushi Sunahara, Ahmed Hassanein, Kentaro Tomita, Shinichi Namba, and Takeshi Higashiguchi, “Optimization of Extreme Ultra-Violet light emitted from the CO2 laser-irradiated tin plasmas using 2D radiation hydrodynamic simulations”, Optics Express 31(20) (2023) 31780-31795.
- Y. Pan, K. Tomita, A. Sunahara, A. Sasaki, and K. Nishihara, “Joint measurement of electron density, temperature, and emission spectrum of Nd:YAG laser-produced tin plasma,” Applied Physics Letters 123 (2023) 204103.
- Takeru Niinuma, Tsukusa Sugiura, Masaki Kume, Yuto Nakayama, Hiroki Morita, Atsushi Sunahara, Shinichi Namba, and Takeshi Higashiguchi, “Evaluationof suprathermal ions in a laser producd plasma beyond-EUV source”, Proceedings Volume 12915. Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology; 129150L (2023). https//doi.org/10.1117/12.2687366
(国際会議会議録掲載論文)
- Atsushi Sunahara,Radiation hydrodynamic simulation study of efficient extreme ultraviolet light emission from laser-produced tin plasmas 12th Advanced Lasers and Photon Sources (ALPS), at PACIFICO Yokohama, Japan, April 18-21, 2023.
Posted : 2024年03月31日